SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Patterning performance of hyper NA immersion lithography for 32nm node logic process
Takahata, Kazuhiro, Chen, Alek C., Lin, Burn, Kajiwara, Masanari, Kitamura, Yosuke, Yen, Anthony, Ojima, Tomoko, Satake, Masaki, Fujise, Hiroharu, Seino, Yuriko, Ema, Tatsuhiko, Takakuwa, Manabu, NakaТом:
7140
Рік:
2008
Мова:
english
DOI:
10.1117/12.804739
Файл:
PDF, 5.48 MB
english, 2008