SPIE Proceedings [SPIE International Symposium on Optoelectonics and Microelectronics - Nanjing, China (Wednesday 7 November 2001)] Semiconductor Optoelectronic Device Manufacturing and Applications - Diffraction limit for circular mask with periodic rectangular aperture
Hwang, Hone-Ene, Yang, Gwo-Huei, Liao, Shu-Hui, Chen, David, Chen, Ray T., Wang, Guo-Yu, Zhu, Chang-ChangТом:
4602
Рік:
2001
Мова:
english
DOI:
10.1117/12.445701
Файл:
PDF, 602 KB
english, 2001
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