SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Full-chip-based subresolution assist features correction for mask manufacturing
Bang, Ju-Mi, Naber, Robert J., Kawahira, Hiroichi, Masumoto, Issei, Ji, Min-Kyu, Jang, Sung-Hoon, Aburatani, Isao, Choi, Ji-Hyun, Woo, Sang-Gyun, Cho, Han-KuТом:
6730
Рік:
2007
Мова:
english
DOI:
10.1117/12.746349
Файл:
PDF, 885 KB
english, 2007
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