SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - Pattern scaling with directed self assembly through lithography and etch process integration
Rathsack, Benjamen, Somervell, Mark, Hooge, Josh, Muramatsu, Makoto, Tanouchi, Keiji, Kitano, Takahiro, Nishimura, Eiichi, Yatsuda, Koichi, Nagahara, Seiji, Hiroyuki, Iwaki, Akai, Keiji, Hayakawa, TakТом:
8323
Рік:
2012
Мова:
english
DOI:
10.1117/12.916311
Файл:
PDF, 8.20 MB
english, 2012
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