SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Alternative Lithographic Technologies III - Defect reduction of high-density full-field patterns in jet and flash imprint lithography
Singh, Lovejeet, Herr, Daniel J. C., Luo, Kang, Ye, Zhengmao, Xu, Frank, Haase, Gaddi, Curran, David, LaBrake, Dwayne, Resnick, Douglas, Sreenivasan, S. V.Том:
7970
Рік:
2011
Мова:
english
DOI:
10.1117/12.879933
Файл:
PDF, 1.24 MB
english, 2011
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