SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Enhancing fullchip ILT mask synthesis capability for IC manufacturability
Cecil, Thomas, Ashton, Chris, Irby, David, Luan, Lan, Son, D. H., Xiao, Guangming, Zhou, Xin, Kim, David, Gleason, Bob, Lee, H. J., Sim, W. J., Hong, M. J., Jung, S. G., Suh, S. S., Lee, S. W.Том:
7973
Рік:
2011
Мова:
english
DOI:
10.1117/12.882814
Файл:
PDF, 450 KB
english, 2011