SPIE Proceedings [SPIE SPIE MOEMS-MEMS - San Francisco, California, USA (Saturday 21 January 2012)] Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V - Wafer scale fabrication of submicron chessboard gratings using phase masks in proximity lithography
Stuerzebecher, Lorenz, Harzendorf, Torsten, Fuchs, Frank, Zeitner, Uwe D., Schoenfeld, Winston V., Rumpf, Raymond C., von Freymann, GeorgТом:
8249
Рік:
2012
Мова:
english
DOI:
10.1117/12.908737
Файл:
PDF, 17.59 MB
english, 2012