SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Toward the ultimate storage device: the fabrication of an ultrahigh-density memory device with 193-nm lithography
Cirelli, Raymond A., Bude, J., Mansfield, William M., Timp, G. L., Klemens, Fred P., Watson, Pat G., Weber, Gary R., Sweeney, James R., Houlihan, Francis M., Gabor, Allen H., Baumann, Fred, Buonanno,Том:
3678
Рік:
1999
Мова:
english
DOI:
10.1117/12.350213
Файл:
PDF, 3.29 MB
english, 1999