SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Managing effects in CD control from PED and PEB in advanced DUV photomask manufacturing using FEP-171 resist
Paulsson, Adisa, Sturtevant, John L., Xing, Kezhao, Fosshaug, Hans, Lundvall, Axel, Bjoernberg, Charles, Karlsson, JohanТом:
5753
Рік:
2005
Мова:
english
DOI:
10.1117/12.599938
Файл:
PDF, 3.10 MB
english, 2005
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