SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Tighter process control of poly- and active-to-contact overlay registration via multilayer analysis
Lee, Peter M. C., Knutrud, Paul C., Sullivan, Neal T.Том:
3998
Рік:
2000
Мова:
english
DOI:
10.1117/12.386453
Файл:
PDF, 1.39 MB
english, 2000