SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Synthesis of novel fluoropolymers for 157-nm photoresists by cyclopolymerization
Kodama, Shun-ichi, Kaneko, Isamu, Takebe, Yoko, Okada, Shinji, Kawaguchi, Yasuhide, Shida, Naomi, Ishikawa, Seiichi, Toriumi, Minoru, Itani, Toshiro, Fedynyshyn, Theodore H.Том:
4690
Рік:
2002
Мова:
english
DOI:
10.1117/12.474160
Файл:
PDF, 289 KB
english, 2002
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