SPIE Proceedings [SPIE 21st European Mask and Lithography Conference - Dresden, Germany (Thursday 16 June 2005)] 21st European Mask and Lithography Conference - Pattern-induced non-uniformity of residual layers in nanoimprint lithography
Bogdanski, Nicolas, Wissen, Matthias, Scheer, Hella-ChristinТом:
5835
Рік:
2005
Мова:
english
DOI:
10.1117/12.637299
Файл:
PDF, 790 KB
english, 2005