SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Robust sub-50-nm CD control by a fast-goniometric scatterometry technique
Hazart, Jérôme, Archie, Chas N., Barritault, Pierre, Garcia, Stéphanie, Leroux, Thierry, Boher, Pierre, Tsujino, KoichiТом:
6518
Рік:
2007
Мова:
english
DOI:
10.1117/12.712844
Файл:
PDF, 1.32 MB
english, 2007