SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Evaluation of TF11 attenuated-PSM mask blanks with DUV laser patterning
Xing, Kezhao, Horiuchi, Toshiyuki, Björnberg, Charles, Karlsson, Henrik, Paulsson, Adisa, Beiming, Peter, Vedenpää, Jukka, Walford, JonathanТом:
7028
Рік:
2008
Мова:
english
DOI:
10.1117/12.793077
Файл:
PDF, 942 KB
english, 2008