SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Metrology, Inspection, and Process Control for Microlithography XV - Method for prevention of unopened contact hole in dual-damascene process
Lyu, Gyu-Ho, Kim, Chang-Hwan, Lee, Suk-Joo, Yang, Hee-Hong, Lee, Dae-Yup, Yoo, Ji-Yong, Lee, Jeong-Woo, Kim, Yoo-Hyon, Nam, Jeong-Lim, Han, Woo-Sung, Sullivan, Neal T.Том:
4344
Рік:
2001
Мова:
english
DOI:
10.1117/12.436747
Файл:
PDF, 368 KB
english, 2001
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