SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Electron cyclotron resonance etching of silylated resist
Lynch, Bob, Das, Siddhartha, Lieberman, Michael A., Hess, Dennis W., Novembre, Anthony E.Том:
1672
Рік:
1992
Мова:
english
DOI:
10.1117/12.59742
Файл:
PDF, 646 KB
english, 1992