Highly sensitive self developing electron-beam resist of aldehyde copolymer
Koichi Hatada, Tatsuki Kitayama, Shigeru Danjo, Heimei Yuki, Hiroaki Aritome, Susumu Namba, Kazuo Nate, Hitoshi YokonoТом:
8
Мова:
english
Сторінки:
4
DOI:
10.1007/bf00265269
Date:
November, 1982
Файл:
PDF, 201 KB
english, 1982