SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Evaluation of inverse lithography technology for 55nm-node memory device
Cho, Byung-ug, Ko, Sung-woo, Choi, Jae-seung, Kim, Cheol-Kyun, Yang, Hyun-jo, Yim, DongGyu, Kim, David, Gleason, Bob, Baik, KiHo, Cui, Ying, Dam, Thuc, Pang, LinyongТом:
6924
Рік:
2008
Мова:
english
DOI:
10.1117/12.772515
Файл:
PDF, 1.97 MB
english, 2008
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