SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Fluidity dependence of deprotonation kinetics of chemically amplified resist
Wallow, Thomas I., Hohle, Christoph K., Okamoto, Kazumasa, Ishida, Takuya, Yamamoto, Hiroki, Kozawa, Takahiro, Fujiyoshi, Ryoko, Umegaki, KikuoТом:
9051
Рік:
2014
Мова:
english
DOI:
10.1117/12.2046057
Файл:
PDF, 381 KB
english, 2014
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