SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Component segregation in model chemically amplified resists
Woodward, John T., Lin, Qinghuang, Fedynyshyn, Theodore H., Astolfi, David K., Cann, Susan, Roberts, Jeanette M., Leeson, Michael J.Том:
6519
Рік:
2007
Мова:
english
DOI:
10.1117/12.711152
Файл:
PDF, 1.04 MB
english, 2007