SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Novel spin-on organic hardmask with high plasma etch resistance
Henderson, Clifford L., Oh, Chang-Il, Lee, Jin-Kuk, Kim, Min-Soo, Yoon, Kyong-Ho, Cheon, Hwan-Sung, Tokareva, Nataliya, Song, Jee-Yun, Kim, Jong-Seob, Chang, Tu-WonТом:
6923
Рік:
2008
Мова:
english
DOI:
10.1117/12.771758
Файл:
PDF, 1.72 MB
english, 2008
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