SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Comparison of OPC models with and without 3D-mask effect
Ser, Jung-Hoon, Dusa, Mircea V., Conley, Will, Park, Tae-Hoon, Jeong, Moon-Gyu, Lee, Eun-Mi, Lee, Sung-Woo, Suh, Chun-Suk, Choi, Seong-Woon, Park, Chan-Hoon, Moon, Joo-TaeТом:
7640
Рік:
2010
Мова:
english
DOI:
10.1117/12.848317
Файл:
PDF, 347 KB
english, 2010
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