Oxidation of Single Crystalline Ti 2 AlN Thin Films between 300 and 900 °C: A Perspective from Surface Analysis
Zhang, Zheng, Chai, Jianwei, Jin, Hongmei, Pan, Jisheng, Wong, Lai Mun, Lim, Suo Hon, Sullivan, Michael B., Wang, Shi JieТом:
120
Мова:
english
Журнал:
The Journal of Physical Chemistry C
DOI:
10.1021/acs.jpcc.6b02296
Date:
August, 2016
Файл:
PDF, 3.87 MB
english, 2016
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