Stress engineering of the alkoxide derived ferroelectric thin film on Si wafer
OHNO, Tomoya, MALIČ, Babara, FUKAZAWA, Hiroaki, WAKIYA, Naoki, SUZUKI, Hisao, MATSUDA, Takeshi, KOSEC, MarijaТом:
117
Рік:
2009
Мова:
english
Журнал:
Journal of the Ceramic Society of Japan
DOI:
10.2109/jcersj2.117.1089
Файл:
PDF, 728 KB
english, 2009