Chemically amplified resists. III. The final phenolic product formation mechanism from t-BOC.
ICHIKAWA, RIEKO, TSUDA, MINORU, OIKAWA, SETSUKOТом:
6
Рік:
1993
Мова:
english
Журнал:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.6.23
Файл:
PDF, 167 KB
english, 1993