Epitaxial growth of germanium thin films on crystal silicon substrates by solid phase crystallization
Isomura, Masao, Kanai, MikuriТом:
54
Мова:
english
Журнал:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.54.04DR08
Date:
April, 2015
Файл:
PDF, 2.62 MB
english, 2015