Influence of deposition rate on the structural properties of plasma-enhanced CVD epitaxial silicon
Chen, Wanghua, Cariou, Romain, Hamon, Gwenaëlle, Léal, Ronan, Maurice, Jean-Luc, Cabarrocas, Pere Roca iТом:
7
Мова:
english
Журнал:
Scientific Reports
DOI:
10.1038/srep43968
Date:
March, 2017
Файл:
PDF, 1.53 MB
english, 2017