Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance
Sharma, Shailesh, Gahan, David, Scullin, Paul, Doyle, James, Lennon, Jj, Vijayaraghavan, Rajani K., Daniels, Stephen, Hopkins, M. B.Том:
87
Мова:
english
Журнал:
Review of Scientific Instruments
DOI:
10.1063/1.4946788
Date:
April, 2016
Файл:
PDF, 1.71 MB
english, 2016
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