Gate tunable magneto-resistance of ultra-thin W Te 2 devices
Liu, Xin, Zhang, Zhiran, Cai, Chaoyi, Tian, Shibing, Kushwaha, Satya, Lu, Hong, Taniguchi, Takashi, Watanabe, Kenji, Cava, Robert J, Jia, Shuang, Chen, Jian-HaoТом:
4
Мова:
english
Журнал:
2D Materials
DOI:
10.1088/2053-1583/aa613b
Date:
March, 2017
Файл:
PDF, 1.62 MB
english, 2017