Lattice kinetic Monte Carlo simulation of epitaxial growth of silicon thin films in H 2 /SiH 4 chemical vapor deposition systems
Balbuena, Juan Pablo, Martin-Bragado, IgnacioТом:
634
Мова:
english
Журнал:
Thin Solid Films
DOI:
10.1016/j.tsf.2017.05.013
Date:
July, 2017
Файл:
PDF, 3.29 MB
english, 2017