A Novel Direct Liquid Injection Low Pressure Chemical Vapor Deposition System (DLI-LPCVD) for the Deposition of Thin Films
Vervaele, Mattias, De Roo, Bert, Debehets, Jolien, Sousa, Marilyne, Zhang, Luman, Van Bilzen, Bart, Seré, Stephanie, Guillon, Herve, Rajala, Markku, Seo, Jin Won, Locquet, Jean-PierreМова:
english
Журнал:
Advanced Engineering Materials
DOI:
10.1002/adem.201700193
Date:
May, 2017
Файл:
PDF, 817 KB
english, 2017
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