Ge/IIIV fin field-effect transistor common gate process and numerical simulations
Chen, Bo-Yuan, Chen, Jiann-Lin, Chu, Chun-Lin, Luo, Guang-Li, Lee, Shyong, Chang, Edward YiТом:
16
Мова:
english
Журнал:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.16.2.024501
Date:
May, 2017
Файл:
PDF, 2.15 MB
english, 2017