A full-process chain assessment for nanoimprint technology on 200-mm industrial platform
Teyssedre, Hubert, Landis, Stefan, Thanner, Christine, Laure, Maria, Khan, Jonas, Bos, Sandra, Eibelhuber, Martin, Chouiki, Mustapha, May, Michael, Brianceau, Pierre, Pollet, Olivier, Hazart, Jerome,Том:
6
Мова:
english
Журнал:
Advanced Optical Technologies
DOI:
10.1515/aot-2017-0018
Файл:
PDF, 2.48 MB
english