Examination of various characteristics for sputtered tantalum oxide-nitride thin films deposited at various oxygen flowrates
Gandhi, Akash A., Chauhan, Kamlesh V., Kapopara, Jaydeep M., Jariwala, Nayan N., Rawal, Sushant K.Том:
185
Мова:
english
Журнал:
Integrated Ferroelectrics
DOI:
10.1080/10584587.2017.1370286
Date:
November, 2017
Файл:
PDF, 1.12 MB
english, 2017
File converter
Більше результатів пошуку
More benefits 
