Enhanced Performance of Ge Photodiodes via Monolithic Antireflection Texturing and α-Ge Self-Passivation by Inverse Metal-Assisted Chemical Etching
Kim, Munho, Yi, Soongyu, Kim, Jeong Dong, Yin, Xin, Li, Jun, Bong, Jihye, Liu, Dong, Liu, Shih-Chia, Kvit, Alexander, Zhou, Weidong, Wang, Xudong, Yu, Zongfu, Ma, Zhenqiang, Li, XiulingМова:
english
Журнал:
ACS Nano
DOI:
10.1021/acsnano.8b01848
Date:
June, 2018
Файл:
PDF, 1.52 MB
english, 2018
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