Improving crystalline quality of sputtering-deposited MoS 2 thin film by postdeposition sulfurization annealing using ( t -C 4 H 9 ) 2 S 2
Ishihara, Seiya, Hibino, Yusuke, Sawamoto, Naomi, Suda, Kohei, Ohashi, Takumi, Matsuura, Kentarou, Machida, Hideaki, Ishikawa, Masato, Sudoh, Hiroshi, Wakabayashi, Hitoshi, Ogura, AtsushiТом:
55
Мова:
english
Журнал:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.55.04EJ07
Date:
April, 2016
Файл:
PDF, 1.30 MB
english, 2016
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