Simulation and Optimization of Film Thickness Uniformity in Physical Vapor Deposition
Wang, Ben, Fu, Xiuhua, Song, Shigeng, Chu, Hin, Gibson, Desmond, Li, Cheng, Shi, Yongjing, Wu, ZhentaoТом:
8
Мова:
english
Журнал:
Coatings
DOI:
10.3390/coatings8090325
Date:
September, 2018
Файл:
PDF, 18.69 MB
english, 2018