Incorporation of Ge on High K Dielectric Material for Different Fabrication Technologies (HBT, CMOS) and Their Impact on Electrical Characteristics of the Device
Khan, Zeeshan Najam, Khan, Shayan Ali, Shakeel, SobiaТом:
2018
Мова:
english
Журнал:
Journal of Nanomaterials
DOI:
10.1155/2018/2497352
Date:
October, 2018
Файл:
PDF, 4.16 MB
english, 2018