Boosting Ge-Epi P-Well Mobility & Crystal Quality with Si or Sn Implantation and Melt Annealing
Borland, John O, Chaung, Shang-Shuin, Tseng, Tseung-Yuen, Joshi, Abhijeet, Basol, Bulent, Lee, Yao Jen, Kuroi, Takashi, Tabata, Toshiyuki, Huet, Karim, Goodman, Gary, Khapochkina, Nadya, Buyuklimanli,Том:
86
Мова:
english
Журнал:
ECS Transactions
DOI:
10.1149/08607.0357ecst
Date:
July, 2018
Файл:
PDF, 2.10 MB
english, 2018
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