Plasma-etched pattern transfer of sub-10 nm structures using a metal–organic resist and helium ion beam lithography
Lewis, Scott M, Hunt, Matthew, DeRose, Guy, Alty, Hayden, Li, Jarvis, Wertheim, Alex, Derose, Lucia, Timco, Grigore A., Scherer, Axel, Yeates, Stephen G., Winpenny, Richard E. P.Журнал:
Nano Letters
DOI:
10.1021/acs.nanolett.9b01911
Date:
August, 2019
Файл:
PDF, 2.99 MB
2019
File converter
Більше результатів пошуку
More benefits 
