Plasmonic titanium nitride via atomic layer deposition: A low-temperature route
Fomra, Dhruv, Secondo, Ray, Ding, Kai, Avrutin, Vitaliy, Izyumskaya, Natalia, Ãzgür, Ãmit, Kinsey, NathanielТом:
127
Мова:
english
Журнал:
Journal of Applied Physics
DOI:
10.1063/1.5130889
Date:
March, 2020
Файл:
PDF, 2.64 MB
english, 2020