Modeling and Experiments of Boron Diffusion During Sub-Millisecond Non-Melt Laser Annealing in Silicon
Noda, Taiji, Felch, Susan, Parihar, Vijay, Vrancken, Christa, Janssens, Tom, Bender, Hugo, Vandervorst, WilfriedТом:
912
Мова:
english
Журнал:
MRS Proceedings
DOI:
10.1557/PROC-0912-C05-06
Date:
January, 2006
Файл:
PDF, 3.21 MB
english, 2006